Function：Designed for UV nanoimprint lithography (UV-NIL), the system enables high-precision replication of nanoscale structures. It supports both working stamp replication and UV nanoimprint lithography for high-fidelity nanostructure transfer.

Function：Direct-write lithography for nanoscale structures on substrates up to 8 inches

Function：180nm semiconductor process node lithography process

Function：800nm~Photolithography of Micron-scale Micro-nano Structures and Device Patterns

Function：1.Micro-nano structure and device pattern lithography; 2.Double-sided alignment lithography.

Function：1.Substrate: silicon,glass,etc.; 2.Photolithography of micro-nano structures and device patterns; 3.Double-sided alignment photolithography.