Function：Used for the fabrication of micro- and nano-scale patterned structures. Supports thermal nanoimprint, UV nanoimprint, and combined thermal and UV nanoimprint processes.

Function：1.Stage travel range: X-axis 300 mm, Y-axis 300 mm, Z-axis 60 mm 2.Maximum substrate size: 250 mm × 250 mm 3.Self-priming ink supply for the printhead 4.Minimum achievable linewidth: ≤ 30 μm 5.Supported ink viscosity: ≤ 450 cps 6.Capable of printing continuous (non-discrete) microstructures, including lines and films formed in a single continuous process 7.Droplet deposition without impact on the substrate, eliminating satellite droplets 8.Editable pattern geometries: dot arrays, continuous lines, polylines, arcs, and continuous thin films 9.Equipped with a real-time CCD video monitoring system