EN
EN CN
Home > Facilities > Micro-/Nano Fabrication > Ancillary lithography equipment
Micro-/Nano Fabrication
  • Automatic Coater/Developer（TRACK）Reservation

    Model：ACT8

    Status： Operating

    Function：Fully automatic coating and developing for 180 nm semiconductor process node

    East Area, Lithography Zone II (Canon)+86-21-34206126-6052
  • 101 Spray CoaterReservation

    Model：101 Spray Coater

    Status： Operating

    Function：Photoresist spin coating and spray coating in semiconductor lithography processes.

    East Area, Lithography Zone III A+86-21-34206126-6005
  • High-Performance Spin CoaterReservation

    Model：RCD8

    Status： Operating

    Function：Photoresist spin coating for wafers up to 8 inches

    East Area, Lithography IIIA Zone+86-21-34206126-6005
  • Semi-Automatic Spin CoaterReservation

    Model：SM-200

    Status： Operating

    Function：Primarily used for the spin coating process in photolithography; enables uniform coating of photoresist or other liquid materials, suitable for high-precision coating on wafers and substrates.

    East Area, Lithography IIIA Zone+86-21-34206126-6029
  • Spin CoaterReservation

    Model：Spin-coater

    Status： Operating

    Function：1.Photoresist spin coating ; 2.Spin coating of flexible substrate precursor materials

    East Area, Lithography IIIA Zone; West Area, Lithography I Zone+86-21- 34206126-6005/6029
  • High-Performance DeveloperReservation

    Model：RCD8

    Status： Operating

    Function：Spray-type development

    East Area, Lithography IIIA Zone+86-21- 34206126-6005
123
SERVICE AND INNOVATION FOR MICRO/NANOTECHNOLOGY

Address: 800 Dongchuan Road, Minhang District, Shanghai 200240, China

Tel: +86 21 3420 7734

Email: aemd@sjtu.edu.cn

  • AEMD-SJTU
©2016 Advanced Electronics Materials and Devices, Shanghai Jiao Tong University.沪交ICP备20151197
×