Semi-Automatic Spin Coater
Spin Module 200
Operating
Model: SM-200
Function: Primarily used for the spin coating process in photolithography; enables uniform coating of photoresist or other liquid materials, suitable for high-precision coating on wafers and substrates.
Engineer: Zhang / +86-21-34206126-6029 / captianzhangdi@1
Location: East Area, Lithography IIIA Zone
Equipment ID: EDD2SMS01
  • Basic Equipment Information
  • Operating Principle
  • Typical Application Case
Main Applications
  1. Mainly used for spin coating in photolithography processes  
  2. Capable of uniformly coating photoresist, electron beam resist, bio-coatings, or other functional liquid materials  
  3. Suitable for high-uniformity coating of wafers (1–8 inches) and special substrates

 

Process / Testing Capabilities
  1. Compatible with 1–8 inch wafers, supports multiple size configurations  
  2. Equipped with automatic spin coating, automatic/manual dispensing, and manual loading/unloading
  3. Adjustable process parameters: spin speed, acceleration, time, and rotation direction  
  4. Supports coating uniformity testing, edge bead removal (EBR), and backside rinse verification

 

Technical Specifications
  1. Supports spin coating for wafers of 1/2/3/4/5/6/7/8 inches
  2. Manual wafer loading/unloading; automatic dispensing (switchable to manual); automatic spin coating  
  3. Spin speed range: 0–6000 rpm; acceleration reaches 6000 rpm within 0.6 seconds  
  4. Speed control accuracy: ±1 rpm; rotation direction: clockwise and counterclockwise  
  5. Supports edge bead removal (EBR) and backside rinse functions

Used in photolithography spin coating processes to uniformly apply photoresist or other liquid materials, enabling high-precision coating on wafers and substrates.

1、Samples must be confirmed with process engineers in advance  
2、Both frontside and backside of the samples must be flat and clean

Available all day. The sample must be confirmed with the process instructor in advance. Both the front and back surfaces of the sample must remain flat and clean. Do not touch the sample directly with your hands before use.

The list below shows FAQs (click a question to view the answer). If your question is not listed, you can leave a message using the link.
FAQs
  • 01
    Spin chuck cannot be lifted

    The waste liquid container needs to be replaced

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