Function：Used for dielectric wet etching and cleaning of 6–8 inch and 3–4 inch wafers. Each tank can process up to 5 wafers simultaneously. Supports dielectric etching and cleaning using phosphoric acid, SPM, and DHF solutions.

Function：This system is equipped with two sets of tanks of different sizes, designed for inorganic RCA cleaning of 6–8 inch and 3–4 inch wafers. Each tank can process up to 5 wafers simultaneously. The system supports full RCA cleaning processes using SC1, SC2, SPM, and DHF solutions.

Function：This device can be used for the independent and flexible cleaning of small samples in small beakers, petri dishes and other vessels. Various inorganic chemical reagents can be used to flexibly realize various cleaning processes.

Function：This equipment is suitable for the independent and flexible cleaning of small samples placed in small vessels such as beakers and petri dishes. It is equipped with a benchtop ultrasonic cleaner, and can flexibly perform processes such as lift-off and photoresist removal using reagents including acetone, isopropanol and PRS3000.

Function：The equipment is equipped with two sets of tanks of different sizes, and can perform lift-off, photoresist removal and other processes using reagents such as acetone, isopropanol and PRS3000.

Function：1.The equipment is equipped with a stainless steel ultrasonic tank (300×300 mm), which enables water bath heating and ultrasonic functions for samples. 2.There are no special restrictions on substrates and their surface materials. 3.The equipment can be externally connected to small desktop devices such as heating and ultrasonic units to achieve flexible processing. 4.It is applicable for processing small and broken samples.