| Model: | Custom |
|---|---|
| Function: | This system is equipped with two sets of tanks of different sizes, designed for inorganic RCA cleaning of 6–8 inch and 3–4 inch wafers. Each tank can process up to 5 wafers simultaneously. The system supports full RCA cleaning processes using SC1, SC2, SPM, and DHF solutions. |
| Engineer: | Li / +86-21- 34206126-6015 / lijinxi@1 |
| Location: | East Area, Inorganic Wet Process III Zone (Strict Metal Control) |
| Equipment ID: | EIM3CRC01 |
This system is designed for RCA cleaning of wafers sized 6–8 inches and 3–4 inches. It is equipped with two sets of tanks of different sizes, each capable of processing up to 5 wafers per batch. Cleaning is performed using SC1, SC2, SPM, and DHF solutions to remove organic contaminants, metal ions, and particles from sample surfaces.
Process / Testing Capabilities
Processes up to 5 wafers (≤8 inches) per batch. SC1 tank is equipped with ultrasonic functionality (adjustable at 80 kHz and 120 kHz). SC1, SC2, and SPM tanks are equipped with heating functions with adjustable temperature settings
Technical Specifications
不可以,需要提前预约,由工程师操作设备