General Organic Cleaning Station

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Equipment Information Guidelines for Contract Processing Inquiry

Operating

Model：	Custom
Function：	This equipment is suitable for the independent and flexible cleaning of small samples placed in small vessels such as beakers and petri dishes. It is equipped with a benchtop ultrasonic cleaner, and can flexibly perform processes such as lift-off and photoresist removal using reagents including acetone, isopropanol and PRS3000.
Engineer：	Li / +86-21- 34206126-6015 / lijinxi@1
Location：	East Area, Organic Wet Process Zone II
Equipment ID：	EOM2GOC01

Reservation

Basic Equipment Information
Operating Principle
Typical Application Case

Primary Application

This equipment is suitable for the independent and flexible cleaning of small samples held in small vessels such as beakers and petri dishes. Equipped with a benchtop ultrasonic cleaner, it is applicable for organic cleaning, lift-off and photoresist removal processes of wafers with various sizes and specifications.

Process / Testing Capabilities

Solutions can be prepared independently in small beakers for the flexible processing of small samples. The equipment is equipped with a benchtop ultrasonic cleaner, allowing for the independent selection of cleaning methods. Corresponding soaking processes can be performed on samples by adding the relevant organic reagents, and the ultrasonic function can be activated to enhance the photoresist removal or lift-off effect.

Technical Specifications

a)Equipment Dimensions: ~1800L×1200W×2000H mm (about)

b)Tabletop Operating Width: 1600 × 900 mm; the width shall be minimized according to the actual design. Material: 2 mm SUS316L

Corresponding soaking processes are performed on samples by adding the relevant organic reagents, and the ultrasonic function may be activated to enhance the photoresist removal or lift-off effect. Photoresist is removed with acetone, followed by further cleaning with isopropanol or anhydrous ethanol; residual organic reagents are then rinsed off with deionized water, and the samples are finally blow-dried with a nitrogen gun.

It is applicable for photoresist removal after lithography, lift-off after sputtering, and organic cleaning of samples.

Reserve this equipment when preparing solutions in beakers is required.

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FAQs

01

设备有超声功能吗？

有桌面型超声

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