Model：C200
Function：1. Etching of metal films such as Al, Mo, Cr and Ti; 2. Etching of organic thin films; 3. Etching of other thin film materials.
Model：SI500
Function：1. Etching of metal films such as Al, Ni, Cr and Ti; 2. Etching of organic thin films; 3. Etching of other thin film materials.
Model：Mill 200
Function：Perform high-anisotropy dry etching on metals, semiconductors, oxides, polymers and other materials.
Model：SI 500
Function：This equipment is used for the etching of compound semiconductor materials, including GaAs-based, InP-based and GaN-based materials.
Model：LKJ-ID-150
Function：1. RIE etching of metal thin films such as Al, Ni, Cr and Ti; 2. Polysilicon etching; 3. Etching of III-V group semiconductors.
Model：Uetch-SyS
Function：VHF etching of SiO₂ thin films
Address: 800 Dongchuan Road, Minhang District, Shanghai 200240, China
Tel: +86 21 3420 7734
Email: aemd@sjtu.edu.cn
