Olympus测量显微镜STM7
(Olympus Measuring Microscope STM7)
主要用途/ Application:
主要用于微纳加工样品的结构观察及测量,也可以适用于超出视场范围大样品测量。
It is mainly used for the structure observation and measurement of micro-nano processing samples, and can also be used for the measurement of large samples beyond the field of view.
设备工作原理简介/ Operating principle:
测量显微镜采用主动反射、共聚焦方法的自动聚焦系统。
Automatic focusing system of active reflection and confocal method for measuring microscope.
图1. 主动反射,共聚焦自动聚焦系统光路
Fig 1. Active reflection, confocal autofocusing system optical path
工艺能力/ capability:
对于标准样品,平面测量精度≤3μm+2%*L,L为测量长度;
对于标准样品,Z轴测量精度≤5μm+3%*L,L为测量长度;
The sample X/Y measurement accuracy:≤3μm+2%*X/Y
The sample Z measurement accuracy:≤3μm+2%*Z
技术指标/ Specifications:
对于标准样品,平面测量精度≤3μm+2%*L,L为测量长度;验收标准L=100mm,L=1mm量测结果L=99.9988mm,L=0.9991mm;
对于标准样品,Z轴测量精度≤5μm+3%*L,L为测量长度;验收标准 L=1.38mm量测结果 L=1.3806mm;
对于开口宽度为40μm、深度超过120μm(深宽比>3)的深硅刻蚀槽样品,深度测量误差≤5μm;验收标准H=131.7nm(by SEM)量测结果H=0.1297mm;
The sample precision of plane measurement ≤3μm+2%*L, L is the measured length; acceptance standard L=100mm, L=1mm Measurement results L=99.9988mm,L=0.9991mm;
The sample Z measurement accuracy≤5μm+3%*L, L is the measured length; acceptance standard L=1.38mm Measurement results L=1.3806mm;
Openings of 40μm width and more than 120μm depth(depth-to-width ratio>3) sample of Deep silicon etching Depth error≤5μm; acceptance standard H=131.7nm(by SEM Measurement results H=0.1297mm;
典型使用案例/ Typical scenario:
1.对于开口宽度为40μm、深度超过120μm(深宽比>3)的深硅刻蚀槽样品,深度测量误差≤5μm;验收标准H=131.7nm(by SEM)量测结果H=0.1297mm;
Openings of 40μm width and more than 120μm depth(depth-to-width ratio>3) sample of Deep silicon etching Depth error≤5μm; acceptance standard H=131.7nm(by SEM Measurement results H=0.1297mm.
2.对于标准样品,Z轴测量精度≤5μm+3%*L,L为测量长度;验收标准 L=1.38mm量测结果 L=1.3805mm;
The sample Z measurement accuracy≤5μm+3%*L, L is the measured length; acceptance standard L=1.38mm Measurement results L=1.3805mm.
3.对于标准样品,平面测量精度≤3μm+2%*L,L为测量长度;验收标准L=100mm,L=1mm量测结果L=99.9988mm,L=0.9991mm;
The sample precision of plane measurement ≤3μm+2%*L, L is the measured length; acceptance standard L=100mm,L=1mm Measurement results L=99.9988mm,L=0.9991mm.
设备类别/Facilities:测试设备/ Test Equipment
设备编号/No.:WF1STMO01
设备地点/Location:西区薄膜一区
工艺工程师/Engineer in response:
姓名:沈赟靓;邮箱:shenyunliang@sjtu.edu.cn;电话:021-34207734-8010
Name: Yunliang Shen; Email:shenyunliang@sjtu.edu.cn; Tel: 021-34207734-8010
设备照片/Photos: