深紫外步进光刻机

（DUV Stepper）

主要用途/ Application：

0.18 um工艺节点光刻

Photolithography at 0.18 um node

 

设备工作原理简介/ Operating principle：

DUV stepper采用 248nm 准分子激光作为光源，工艺节点在 180nm 水平，采用了步进扫描投影式光刻，光源通过掩模， 经光学镜头调整和补偿后，以步进重复的方式在硅片上实现曝光，精度高且曝光速度极快。

The DUV stepper utilizes 248nm excimer laser as the light source, have a resolution of 180nm. It employs step-and-scan projection lithography, in which the light source passes through a mask, and then, after being adjusted and compensated for by an optical lens, the exposure is realized on the wafer in a step-and-repeat manner, with high precision and extremely fast exposure speeds.

 

工艺能力/ Capability：

1. WPH: 120~130 片wafer。
2. 曝光光源: 248nm KrF
3. 加工晶圆尺寸: 6/8 inch（其他尺寸请联系工艺老师确认）
4. 最大曝光面积: 22 mm × 22 mm
5. 极限分辨率: ≤150 nm
6. 对准精度SMO: 3σ≤ 25 nm
7. 镜头缩放比例: 5：1

 

1. WPH: 120~130 pcs/hrs.
2. wavelength: 248nm KrF
3. Wafer size: 6/8 inch (For other dimensions, please contact the process engineer for confirmation.)
4. Max shot size: 22 mm × 22 mm
5. Best resolution: ≤150 nm
6. Overlay SMO: 3σ≤ 25 nm
7. Reduce ratio: 5：1

 

设备类别/Facilities：光刻/图形化设备/ Lithography/Patterning Equipment

设备编号/No.：ELT2DUV01

设备地点/Location：东区光刻Ⅱ区(Canon)/ East Lithography Area II (Canon)

 

工艺工程师/Engineer in response:

姓名：徐老师；邮箱：xu.jian@sjtu.edu.cn；电话：021- 34206126-6018

Name: Teacher Xu, Email：xu.jian@sjtu.edu.cn, Tel: 021- 34206126-6018.

 

设备照片/Photos：