Eitre-6纳米压印机
(Eitre-6 Nano Imprint Lithography System)
主要用途/ Application:
- 用于实现微纳图形结构的制备,可以使用热压印、UV压印以及热和UV同时压印(STU ™);
- 成熟的软模板(IPS)转印工艺及技术;
- 可使用镍、硅、石英等模板,适用于各种不同的衬底材料,包括Si、石英、GaAs、聚合物薄片等;
- 最小压印尺寸≤20nm;最大压力:80bar。
- For the preparation of micro/nano structures through Thermal imprint, UV imprint, and Simultaneous Thermal and UV (STU) process (STU ™);
- Mature soft template transfer process;
- Capable of handling stamps made of nickel, silicon, quartz and polymeric stamps, and various kinds of substrate materials, including: Si, quartz, GaAs and polymeric sheets;
- Imprint minimum feature size :<20nm;Imprint Pressure (Maximum): 80 bar.
设备工作原理简介/ Operating principle:
纳米压印技术通过模具和压印胶的直接接触将纳米尺寸的图形转移到涂有压印胶的晶圆上,使用紫外光或者高温将压印胶固化后进行脱模。Eitre-6纳米压印机采用气体软压技术,有力保证了压印的均匀性与一致性,减少碎片的发生。中间聚合物(IPS)可以最大程度保护原始模具,延长模具使用寿命。
Nano Imprinting technology can transfer the nano-sized patterns from the stamp to the wafer through imprinting resist, which can be cured with ultraviolet light or high temperatures. In the NIL process, nano-sized patterns are fabricated by physical contact between the stamp and the imprinting resist. Eitre-6 Nano Imprint Lithography System adopts SoftPress technology to ensure the uniformity and fidelity of imprinting, and reduce the occurrence of fragments. Intermediate Polymer Stamp (IPS) enables contamination control, increases the master stamp lifetime and makes the imprint process less sensitive to substrate contaminations and surface roughness.
工艺能力/ capability:
- 最小压印尺寸:<20 nm;
- 最小底胶厚度:<15 nm;
- 母模/衬底尺寸:≤6 inch(基底尺寸兼容10 mm-152 mm);
- 母模/衬底厚度:≤2 mm;
- 压印压力:10-80 bar;
- 压印温度:室温-200℃;
- UV波长:365±10 nm;
- UV光强:40 mW/cm2;
- 印章材料可以是镍、硅、石英及聚合物,衬底材料主要是硅、石英、GaAs及聚合物薄片;
- 可以使用聚合物印章(IPS)做压印工艺的中间层。
- Minimum Feature Size: < 20 nm;
- Minimum Residual Layer Thickness: < 15 nm;
- Stamp/Substrate size: ≤ 6 inch (substrate in the range of 10 mm to 152 mm can be used);
- Stamp/Substrate Thickness: ≤2 mm;
- Imprint Pressure: 10-80 bar;
- Imprint temperature: from ambient temperature to 200º;
- UV wavelength: 365±10nm;
- UV light intensity: 40mW/cm2;
- Capable of handling stamps made of nickel, silicon, quartz and polymeric stamps, and various kinds of substrate materials, including: Si, quartz, GaAs and polymeric sheets;
- Able to use a polymer stamp as intermediate steps for imprinting work.
典型使用案例/ Typical scenario:
- 纳米光子晶体;
- 亚波长光栅结构;
- 太阳能电池;
- 有机发光二极管(OLED);
- 生物微沟道。
- Nanophotonic crystal;
- Subwavelength gratings;
- Solar cells;
- OLED;
- Biological microchannels.
设备类别/Facilities:光刻/图形化设备 Lithography / Patterning Equipment
设备编号/No.:WPHNILE01;
设备地点/Location:西区光刻区
工艺工程师/Engineer in response:
姓名:徐丽萍;邮箱:lipingxu@sjtu.edu.cn;电话:021-34207734-8027
Name: Liping Xu;Email:lipingxu@sjtu.edu.cn; Tel: 021-34207734-8003.
设备照片/Photos: