| Model: | STM7 |
|---|---|
| Function: | It is primarily used for structural observation and measurement of micro- and nano-fabricated samples. |
| Engineer: | Teacher Shen / +86-21- 34207734-8010 / shenyunliang@1 |
| Location: | East Area,Thin Film Zone IV |
| Equipment ID: | EFM4STM01 |
It is primarily used for structural observation and measurement of micro- and nano-fabricated samples, and can also be applied to measurements of large samples exceeding the field of view.
Technical Specifications
For standard samples, the planar measurement accuracy is ≤3µm+2%×L, where L is the measured length. Acceptance criteria: for L=100mm, the measured result is 99.9988 mm; for L=1mm, the measured result is 0.9991 mm.
For standard samples, the Z-axis measurement accuracy is ≤5µm+3%×L, where L is the measured length. Acceptance criteria: for L=1.38mm, the measured result is 1.3806 mm.
For deep silicon-etched trench samples with an opening width of 50 µm and a depth greater than 120 µm, the depth measurement error is ≤ 5 µm.
During equipment operation, do not touch the equipment or operate the computer to avoid accidental actions that may cause equipment shutdown or malfunction.
If any equipment alarm occurs, please notify the responsible equipment engineer.
测量显微镜可以测量超出视场范围大样品尺寸。