High-resolution X-ray diffraction (HRXRD) system
High-Resolution X-ray Diffractometer System
Operating
Model: D8 Discover
Function: It is used to characterize the epitaxial structure, film thickness, crystallinity, crystal orientation, and interfacial relaxation of single-crystal thin films on 4-inch semiconductor wafers.
Engineer: Teacher Shen / +86-21- 34207734-8010 / shenyunliang@1
Location: East Area,Testing Zone IV
Equipment ID: ETE4HRX01
  • Basic Equipment Information
  • Operating Principle
  • Typical Application Case
Main Application

X-ray diffraction(XRD) is used for phase identification, crystal structure analysis, residual stress measurement, crystallinity evaluation, texture characterization, and nanomaterial research. It is widely applied in materials science, chemistry, geology, and related fields.

 

Process/Testing Capabilities

XRD is a multifunctional, high-precision X-ray diffraction analysis system integrated with advanced capabilities such as micro-area analysis and 2D detection. The system is equipped with a high-resolution goniometer, a micro-focus X-ray optical system, and a high-speed two-dimensional detector, enabling micro-area diffraction, high-resolution XRD (HRXRD), and grazing-incidence thin film analysis.

Its key advantage lies in the ability to perform crystallographic analysis on microscopic regions of a sample (e.g., individual grains or defects), providing comprehensive crystallographic solutions for research in semiconductors, new energy materials, nanomaterials, and geological samples.

 

Technical Specifications

  1. X-ray tube type: Cu target ceramic X-ray tube, with a tube power ≥ 2.2 kW and a lifetime ≥ 4000 hours.
  2. All optical accessories are designed in a modular format, enabling tool-free installation and removal.
  3. The direct beam intensity before the absorption filter is ≥ 3 × 10⁷ cps.
  4. The diffraction beam path is a three-path system automatically switched by software: (1) variable divergence slit for diffraction path; (2) analyzing crystal optical module; (3) automatic beam attenuator (absorption filter).
  5. Vertical θ/θ goniometer configuration with horizontal sample mounting.
  6. X-axis translation stage with a travel range of ±40 mm, motor-driven.
  7. Y-axis translation stage with a travel range of ±40 mm, motor-driven.
The principle of X-ray diffraction (XRD) is based on Bragg’s Law (nλ=2dsinθ). When monochromatic X-rays are incident on a crystalline material, the periodically arranged atomic planes act as a diffraction grating, producing coherent diffraction at specific angles (θ). By measuring the diffraction intensity and angular distribution, information such as interplanar spacing (d), crystal structure, phase composition, and crystallographic orientation can be obtained.

For polycrystalline samples, the diffraction pattern consists of a series of characteristic peaks, and phase identification can be achieved by comparison with standard reference databases. For single-crystal analysis, atomic positions can be resolved. The atomic-scale structural sensitivity of XRD makes it a fundamental and essential technique for materials characterization.

GaAs (004) plane Omega–2θ scan of the sample.

 

Sample size: thin film samples smaller than 4 inches. Full information of all layers must be provided for testing. A flat measurement area larger than 10mm×10mm is generally required.

For high-resolution measurements, the crystallographic plane to be analyzed must be specified (including Miller indices, 2θ angle, etc.).

For X-ray reflectivity (XRR) samples: the surface roughness is typically less than 5nm, and complete information of all sample layers must be provided for measurement.

The list below shows FAQs (click a question to view the answer). If your question is not listed, you can leave a message using the link.
FAQs
  • 01
    X射线强度不稳定或信号微弱

    可能原因:X光管老化、光路准直偏移、样品未对准或探测器故障。 解决建议:检查X光管寿命(建议>20,000小时),重新校准光路(使用标准样品如Si或LaB6),确保样品居中,必要时联系工程师检测探测器性能。

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