Carbon Material Growth and Deposition System
Carbon Material Growth and Deposition System
Commissioning
Model: EasyTube® 3000
Function: Hot-wall tube CVD system for nanomaterial growth, suitable for research and production of carbon nanotubes (CNTs) and graphene thin films.
Engineer: Xu / +86-21- 34206126-6030 / lipingxu@1
Location: East Area, Packaging II Zone
Equipment ID: EPK2CGD01
  • Basic Equipment Information
  • Operating Principle
  • Typical Application Case
Main Application

This system is used for CVD growth of carbon nanotubes and graphene thin films. It is compatible with various sample forms, including planar substrates, rolled materials, and 3D porous structures. Both low-pressure and atmospheric-pressure processes are supported.

Process / Testing Capabilities

Resistance-heated furnace with three independently controlled temperature zones.. Dual temperature control: furnace control and in-chamber temperature monitoring. Maximum temperature: 1100°C. Temperature uniformity in the central constant-temperature zone: better than ±0.5°C

Technical Specifications

Compatible with samples up to 4 inches. Maximum operating temperature: 1100°C

At high temperatures, carbon source gases (e.g., methane) decompose. Carbon atoms deposit on the surface of metal catalysts (such as Ni or Cu) and self-assemble into carbon nanotubes (guided by catalyst particles) or graphene (formed via surface-catalyzed growth).

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Growth of monolayer graphene on copper foil (e.g., CVD Corporation process).
Prior communication is required to ensure catalyst effectiveness.
The list below shows FAQs (click a question to view the answer). If your question is not listed, you can leave a message using the link.
FAQs
  • 01
    可否长多层石墨烯?

    可以

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