| Model: | EasyTube® 3000 |
|---|---|
| Function: | Hot-wall tube CVD system for nanomaterial growth, suitable for research and production of carbon nanotubes (CNTs) and graphene thin films. |
| Engineer: | Xu / +86-21- 34206126-6030 / lipingxu@1 |
| Location: | East Area, Packaging II Zone |
| Equipment ID: | EPK2CGD01 |
This system is used for CVD growth of carbon nanotubes and graphene thin films. It is compatible with various sample forms, including planar substrates, rolled materials, and 3D porous structures. Both low-pressure and atmospheric-pressure processes are supported.
Process / Testing Capabilities
Resistance-heated furnace with three independently controlled temperature zones.. Dual temperature control: furnace control and in-chamber temperature monitoring. Maximum temperature: 1100°C. Temperature uniformity in the central constant-temperature zone: better than ±0.5°C
Technical Specifications
Compatible with samples up to 4 inches. Maximum operating temperature: 1100°C
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