Dual-Chamber Electron Beam Evaporation Coating System

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Dual chamber electron beam evaporation coating system

Operating

Model：	E550D
Function：	Capable of depositing high-quality thin films with precisely controllable thickness at room temperature, including elemental metals (especially refractory precious metals such as Pt and Pd) and various compound materials.
Engineer：	Fu / +86-21- 34206126-6010 / xuecheng.f@1
Location：	Thin Film Zone IV, East Area
Equipment ID：	EFM3EBE01

Reservation

Basic Equipment Information
Operating Principle
Typical Application Case

Main Application

At room temperature, metal thin films such as Cr, Cu, Ni, Al, Y, Ti, Pt and Pd can be deposited by evaporation on samples smaller than 8 inches, fully meeting the requirements of the lift-off process.

Process/Testing Capability

Supports thin film evaporation for samples up to 8 inches in size.
Capable of depositing metal thin films including Cr, Cu, Ni, Al, Y, Ti, Pt and Pd.
Enables film deposition at room temperature for evaporation with photoresist retained.

Technical Specifications

Non-uniformity: ±5% @ 8-inch substrate
The thickness of evaporated aluminum films is limited to 1 μm maximum.
For materials with an obvious hollowing effect during evaporation (e.g., Cr), the non-uniformity is ±10% @ 8-inch substrate.

Thermal electrons emitted by the tungsten filament are accelerated and focused by the high-voltage electric field between the cathode and anode, then deflected by a magnetic field to reach the surface of the evaporant material in the crucible. The electron bombardment induces lattice vibration and heat release, melting or subliming the material to complete evaporative deposition.

Thin-film transistor devices fabricated with electron-beam evaporated palladium (Pd) thin films

The thickness of samples to be processed shall not exceed 1 mm. For extra thick or heavy samples, customized fixing fixtures need to be prepared by users themselves.

The list below shows FAQs (click a question to view the answer). If your question is not listed, you can leave a message using the link.

FAQs

01

双腔电子束蒸发镀膜系统能否蒸镀多层膜？

双腔电子束蒸发镀膜系统具有6个坩埚位，可以蒸镀多层薄膜。
02

相比较西区的电子镀膜设备，双腔电子束蒸发镀膜系统蒸镀的材料有什么不同？

双腔电子束蒸发镀膜系统电子枪功率更大，可以蒸镀难熔的Pt、Pd等贵金属薄膜。
03

相比较西区的电子镀膜设备，双腔电子束蒸发镀膜系统蒸镀的样品尺寸有什么不同？

衬底尺寸更大，可以满足8英寸样品的制备，也可以同时蒸镀3个4英寸的样品。

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