| Model: | HP-200 |
|---|---|
| Function: | Primarily used in photolithography baking processes, including photoresist pre-baking, post-baking, and other thermal treatments. Ensures uniform heating to improve pattern quality and adhesion. |
| Engineer: | Zhang / +86-21- 34206126-6029 / captianzhangdi@1 |
| Location: | East Area, Lithography IIIA Zone |
| Equipment ID: | EDD2HPS01、EDD2HPS02 |
Used in photolithography baking processes, including photoresist soft bake, post-exposure bake, and other thermal treatments. The system ensures uniform heating to improve pattern quality and adhesion.

1、Samples must be confirmed with process engineers in advance
2、Both frontside and backside of the samples must be flat and clean
Available for use throughout the day. Samples must be confirmed with process engineers in advance. Both frontside and backside of the samples must be flat and clean. Please keep the equipment clean and tidy after use
No, it is not required.