This system is designed for high-temperature thermal processing of samples, including ion activation and damage recovery for micro- and nano-fabricated structures, as well as thermal treatment of special materials.It is a critical thermal processing tool in micro- and nano-fabrication processes and has a wide range of applications.

Process/Testing Capabilities

Capable of thermal processing within a temperature range from room temperature to 1100°C.Ramp rate: 10°C/min; cooling method: natural cooling.Process duration is fully programmable, allowing flexible recipe control and multi-step process programming.

Technical Specifications

Compatible with a wide range of sample sizes. Process atmosphere can be selected as required, including nitrogen (N₂) ambient operation.

Model: BF51842PC-1

Temperature range: 100–1100 °C

Chamber volume: 55.3 L

Multi-segment, multi-program controller with up to 30 programmable recipes

Temperature control accuracy: ±0.1%

Top exhaust port: 1 inch

Rear inert gas inlet: 0.375 inch

Patented heating elements embedded within the insulation layer; double-layer furnace housing design

Power supply: 240 V, 50/60 Hz; Power rating: 5800 W