Equipped with a powerful 522 nm femtosecond laser source, it enables efficient and high-speed printing of SU8, AZ resist, ma-P100 resist, as well as metal layers and ORMOCER organic-inorganic hybrid resists. It can fabricate macroscopic structures with heights exceeding 1 millimeter, produce microstructures with exceptional surface quality and roughness as low as 10 nm, achieve a minimum feature size down to 100 nm, and deliver a scanning speed of over 1000 mm/s. The manufacturing processes for 3D nano-, micro- and macroscopic structures allow users to fully leverage various techniques for customized processing, and produce complex microstructures with high throughput in a single process step. It can be applied in fields such as micro-optics, optoelectronics, micromechanics, biomedical engineering, and quantum devices.

• Printing Height：≥1 mm
• Surface roughness：≤10 nm
• Resolution：line≤100 nm（horizontal），Space≥150nm
• Alignment accuracy：≤1.5 um
• Print area：100 x 100 mm²
• Materials (additive or subtractive）：ORMOCER®s, SU-8, AZ-series, ma-P 1200, Metal (e.g. Ag, Au, Cr, ...)

• Femtosecond laser: wavelength λ = 522 ± 3 nm
• Scanning speed: 10m/s divided by the magnification (10x writing module: no less than 1000mm/s)
• Processing Mode: Stitching Free manufacturing capability, with synchronous galvanometer scanners and worktables (Infinite Field of View, IFoV) to achieve stitching-free manufacturing
• Scanning Strategy: Full-volume scanning exposes the entire structure layer by layer; contour scanning