| Model: | 870S |
|---|---|
| Function: | Capable of automated spin drying for one cassette of 4-inch or 6-inch wafers (up to 25 wafers per batch)Wafers are first rinsed with deionized (DI) water, followed by high-speed spin drying using high-purity nitrogen (N₂) |
| Engineer: | Mr. Li / +86-21- 34206126-6015 / lijinxi@1 |
| Location: | West Area,Inorganic Wet Processing Zone I (Strict Metal Control) |
| Equipment ID: | WW1OSRD01、WW2OSRD02 |
Process/Testing Capability
The system is equipped with upper and lower chambers, enabling independent spin-drying processes for 4-inch and 6-inch silicon wafers, respectively.
Technical Specifications


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