Parylene 沉积系统
(Parylene Deposition System)
主要用途/ Application:
主要用于沉积聚对二甲苯(Parylene)的C、D、N、F不同类型的薄膜材料。薄膜具有防潮、化学阻隔和电绝缘特性,以及比较好的热稳定性和紫外线稳定性,以及干膜润滑性。
This equipment deposits thin films of parylene in C, D, N, and F varieties. The deposited thin films have combined properties such as moisture-proof, chemical barrier, and electrical insulation, good thermal stability, good UV stability, and dry film lubricity.
设备工作原理简介/ Operating principle:
在真空下加热称为二聚物的固态颗粒状原材料,形成二聚物气体。 随后热解气体,将二聚物裂解为单体形态。 在室温沉积室内,单体气体在所有表面沉积,形成薄而透明的聚合物膜。 薄膜材料以气体形态涂敷,涂层可轻松渗透多层组件的缝隙和狭小区域,能够保证较好的台阶覆盖。
A solid granular raw material called dimer is heated under vacuum to form a dimer gas. Subsequently, the pyrolysis gas breaks down the dimer into monomer form. In a room temperature deposition chamber, the monomer gas is deposite on all surfaces, forming a thin and transparent polymer film. The thin film material is coated in gas form, and the coating can easily penetrate the gaps and narrow areas of multi-layer components, ensuring good step coverage.
工艺能力/ Capability:
满足沉积500nm-100um的Parylene薄膜,4英寸非均匀性±5%,沉积速度5um/h
Deposited Parylene film with a thickness of 500nm-100um, 4-inch non-uniformity ± 5%, deposition rate of 5um/h
技术指标/ Specifications:
衬底一般不大于6英寸,膜厚不低于300nm。
The substrates are no larger than 6 inches, and the film thickness is no less than 300nm.
典型使用案例/ Typical scenario:
在镁基钯合金等探测氢传感器的器件上沉积薄膜用于隔绝水和氧气对器件的影响。
Depositing thin films on devices such as magnesium based palladium alloys for hydrogen sensors to prevent the effects of water and oxygen on the devices.
设备类别/Facilities:薄膜沉积设备/ Thin Film Deposition Equipment
设备编号/No.:EW1PDSS01
设备地点/Location:东区,薄膜四区
工艺工程师/Engineer in response:
姓名:付学成;电话:34207734-8005;邮箱:xuecheng.f@sjtu.edu.cn
Name: Xuecheng Fu; Phone: 34207734-8005; Email: xuecheng.f@sjtu.edu.cn
设备照片/Photos: