AEMD平台简介

先进电子材料与器件校级平台（AEMD）创建于2012年，于2014年11月6日起正式对外运行，是为全校科研工作提供服务的大型仪器设备校级共享平台，具备10nm至微米级微纳器件与图形的加工与测试能力。AEMD平台在学校各级领导的大力支持下，成为相关学科依托发展的重要支撑力，同时也为科研工作提供完善的保障。

AEMD平台分别座落于交大闵行校区微电子大楼一层（西区）以及综合实验楼一层（东区）（2014年8月东西区合并），实验室共有近1510m2的100级、1000级净化室，其中100级210 m2，1000级约1300m2。除此之外，平台还拥有近250m2非净化测试加工区。

平台建设有一条能对硅、玻璃和有机材料进行微纳米加工的3～6英寸半导体级实验线（西区实验室）以及一条3～4英寸非硅/MEMS微纳加工实验线（东区实验室），部分设备可实现8英寸基片加工。平台拥有电子束曝光系统、双束聚焦离子束系统、双面对准紫外光刻机（3台）、热压/紫外纳米压印系统、涂胶显影系统（3套）、微波去胶机（3台）、氧化扩散炉（5管，2套）、多晶硅/氮化硅LPCVD炉（2管）、快速热处理设备、湿法清洗刻蚀台（12台套）、多靶磁控溅射系统（4台套）、超高真空磁控溅射系统、电子束蒸发设备（2套）、离子束溅射机、离子束刻蚀机、等离子增强化学气相沉积设备、金属反应离子刻蚀设备、介质反应离子刻蚀设备、深硅刻蚀系统（2套）、微电铸/电镀系统、OLED器件实验制备系统、基片抛磨设备、砂轮切片系统、场发射扫描电镜、原子力显微镜、半导体参数测试仪（2套）、霍尔效应仪、四探针测试仪、表面轮廓仪（3台）、紫外膜厚仪等先进的微纳加工与测试设备，具备10nm至微米级微纳器件与图形的加工与测试能力。

AEMD平台的创建提高了我校大型仪器的利用水平，并为跨学科的交叉研究、国内外的合作提供了平台，也为高层次的人才培养提供了良好的实验基地；平台也向社会相关科研机构与企业公开开放，提供相关项目合作与微纳加工服务。

About Center for Advanced Electronic Materials and Devices (AEMD)

Center for Advanced Electronic Materials and Devices (AEMD) of Shanghai Jiao Tong University was invested by the ‘985 Project’ of Ministry of Education. The center intends to build university-level micro-nano fabrication and testing platform and perform the state of art research on semiconductor materials and devices, optoelectronic materials and devices, MEMS technologies, and IC chip packaging technologies. It is also opened to the research groups outside the university.

AEMD is located in Microelectronics Building (West Lab) and Comprehensive Laboratory Building (East Lab) respectively of Minghang campus of SJTU. It has about 1600 m2 of class 100, class 1000 and class 10000 cleanroom; 100 class cleanroom: 210 m2, class 1000 cleanroom: 1300 m2, class 10000 cleanroom: 90 m2.

AEMD is capable of a 3”~6” wafer scale semiconductor level experimental line in its west laboratory, and 3”~4” non-silicon-base/MEMS micro-nano fabrication experiment line in its east laboratory. Some tools in the lines can provide 8 inch fabrication services. The center can fabricate on silicon, glass, and polymer substrates with feature size down to 10nm~10um.

The center is equipped with micro-nano fabrication facilities including e-beam lithography, dual-beam focused ion beam system(FIB), double-side alignment UV aligner(3 sets), thermo-compressing/UV nano-imprinter, spin-coating and developing system, plasma Photo-resist stripper (3 sets), oxidation and diffusion furnace (2 sets), polysilicon/nitiride low-pressure CVD (2 tubes), rapid thermal processing tool, wet clean/etching bench(12 sets), mutiple-target sputtering system (4 sets), e-beam/thermal evaporator (E-gun, 2 sets), ion beam sputter, ion beam milling, plasma enhanced CVD (PECVD), reactive ion etcher (RIE-metal), reactive ion etcher (RIE-dielectrics), deep-silicon reactive ion etching system (Deep-RIE, 2 sets), Micro electro-casting/plating system, OLED device fabrication system, substrate grinding and polishing system, die sawing tool, and so on. It is also equiped some material and device characterization instruments like field-emission scanned electron microscope (FE-SEM), atomic force microscope (AFM), semiconductor parameter tester, Hall effect tester, surface profiler, UV film thickness tester, etc.

AEMD center provides a cooperation and communication platform for different research fields and a practice base for high level talents’ training. The center is also opened to the research affiliates and industry outside SJTU on related project cooperation and micro-nano fabrication services.