紫外可见分光光度计

（UV-vis Spectrophotometer）

主要用途/ Application：

190nm~2500nm波长范围内薄膜样品吸光度(A)/反射率(R%)/透过率(T%)测试

Measurement of absorbance (A), reflectance (R%), and transmittance (T%) in the wavelength range of 190nm to 2500nm on film sample.

 

设备工作原理简介/ Operating principle：

PerkinElmer Lambda 750紫外可见近红外分光光度计采用双光源、双光束、双单色器的光学设计，通过发射不同波长的光，测量物质对光的吸收、反射、透射等特性；样品与光相互作用后检测器测量光强度，并通过数据处理和算法分析输出分析结果，得到物质的光谱吸收曲线，仪器拥有测试光谱范围宽、分辨率高、灵敏度高、和准确度高的特点，可在光学、涂层、薄膜材料等领域广泛应用。

The PerkinElmer Lambda 750 UV-vis spectrophotometer adopts an optical design of dual light sources, dual beams, and dual monochromators. By emitting light of different wavelengths, it measures the absorption, reflection, transmission, and other characteristics of substances towards light; After the interaction between the sample and light, the detector measures the light intensity and outputs the analysis results through data processing and algorithm analysis, obtaining the spectral absorption curve of the substance. The instrument has the characteristics of wide testing spectral range, high resolution, high sensitivity, and high accuracy, and can be widely used in the fields of optics, coatings, thin film materials, etc.

 

技术指标/ Specifications：

积分球：100mm直径PbS积分球

测量波长范围：190 nm ~ 2500 nm

样品尺寸：＞ 20mm*30mm，≤ 4英寸

Integral sphere: 100mm diameter PbS integral sphere

Measurement wavelength range: 190 nm~2500 nm

Sample size: ＞ 20mm * 30mm, ≤ 4 inch

 

典型使用案例/ Typical scenario：

Si/Si3N4薄膜反射谱（狭缝宽度：2nm，积分时间：0.2s）：

Reflection spectrum of Si/Si3N4 thin film (slit width: 2nm, integration time: 0.2s)

 

设备类别/Facilities：测试设备/ Characterization

设备编号/No.：ETE3UVV01

设备地点/Location：东区测试Ⅲ区/ East Testing III Area

 

工艺工程师/Engineer in response:

姓名：瞿敏妮；邮箱：minni.qu@sjtu.edu.cn；电话：021- 34207734-8003

Name: Minni Qu；Email：minni.qu@sjtu.edu.cn; Tel: 021- 34207734-8003.

 

设备照片/Photos：