自动涂胶显影机（TRACK）

（Auto Clean Track (ACT8)）

主要用途/ Application：

0.18 um 工艺节点上配合DUV光刻机完成涂胶显影工艺。

Perform coating and developing process at 0.18 um photolithography process node.

 

设备工作原理简介/ Operating principle：

全自动涂胶显影一体机是DUV 光刻机的配套设备，能满足工艺节点在0.18um条件下的匀胶显影工艺需求。该装置使用全自动芯片传送系统，通过对流量、温度、时间等参数的设定，自动完成涂胶烘烤显影等工艺操作。

Automatic coating and developing system，which is the supporting equipment of DUV lithography machine, can meet the demand of  coating and developing process at the process node of 0.18 um. By setting parameters such as flow rate, temperature and time, the device uses a fully automated chip transfer system to automatically complete the gluing, baking, developing and other process operations.

 

工艺能力/ Capability：

1. 3/4/6/8 inch wafer 兼容
2. WPH: 40~50 片wafer。
3. 涂胶均匀性：
4. 片内3σ < 6.5%；
5. 片间3σ < 6.5%；
6. 批间3σ < 2%。

 

1. 3/4/6/8 inch wafer compatible.
2. WPH: 40~50 pcs/hr.
3. Coating uniformity：
4. Within wafer:  3σ < 6.5%
5. wafer to wafer: 3σ < 6.5%
6. Lot to lot: 3σ < 2%

 

 

 

 

 

 

 

 

 

 

设备类别/Facilities：光刻/图形化设备/ Lithography/Patterning Equipment

设备编号/No.：ELT2ACTO1

设备地点/Location：东区光刻Ⅱ区(Canon)/ East Lithography II Area (Canon)

 

工艺工程师/Engineer in response:

姓名：徐辉；邮箱：hui.xu25951@sjtu.edu.cn；电话：021-34206126-6052

Name: Hui Xu；Email：hui.xu25951@sjtu.edu.cn; Tel: 021-34206126-6052.

 

设备照片/Photos：