桌面式激光直写光刻机

（Desktop Laser Direct Writing）

主要用途/ Application：

1. 光刻胶直写功能，在基片上直写微米尺度的光刻胶图形；
2. 套刻直写功能
3. SU8光刻胶直写功能

 

1. Photoresist direct writing function to write micron-scale photoresist graphics.
2. Overlay aligning direct writing.
3. SU8 resist direct writing.

 

设备工作原理简介/ Operating principle：

激光直写光刻作为一种无掩模光刻技术，是利用强度可变的激光束对基片表面的抗蚀材料实施变剂量曝光，显影后在抗蚀层表面形成所要求的图形。能够实现高精度加工，不需要制作模板，可以适用于多种不同材料的加工，包括玻璃、金属、硅片、半导体、聚合物等。

Laser direct writing lithography, as a maskless photolithography technology, utilizes a laser beam of variable intensity to implement variable-dose exposure of the resist material on the surface of the substrate, and after development, the required pattern is formed on the surface of the resist layer. It is capable of high-precision processing without the need for templates, and can be applied to a wide range of different materials, including glass, metal, silicon wafers, semiconductors, polymers, etc..

 

技术指标/ Specifications：

1. 最大尺寸：5寸以下
2. 365nm激光分辨率：1.0 μm

 

1. Maximum size: under 5 inches
2. laser resolution at 365nm: 1.0 μm

 

典型使用案例/ Typical scenario：

光刻胶图形直写，SU8光刻胶直写

 

设备类别/Facilities：光刻/图形化设备/ Lithography/Patterning Equipment

设备编号/No.：ELT3MLA01

设备地点/Location：东区光刻ⅢA区/ East Lithography IIIA Area

 

工艺工程师/Engineer in response:

姓名：王凤丹；邮箱：fdwang@sjtu.edu.cn；电话：021-34206126-6005

Name: Fengdan Wang；Email：fdwang@sjtu.edu.cn; Tel: 021-34206126-6005.

 

设备照片/Photos：