AEMD平台将举行“原子层沉积（ALD）技术及其应用讲座”，欢迎各位师生参加，谢谢！
时间：2013年11月29日（周五）下午3:00
地点：上海交通大学.微电子大楼.401会议室 (凯旋门西侧楼）
主题：Introduction to Atomic Layer Deposition technology and it’s applications
主讲人：芬兰PICOSUN公司黎微明博士，Picosun公司应用总监，18年的ALD经验。
ALD技术背景介绍：
ALD技术于1974年由芬兰PICOSUN公司的董事Dr. Tuomo Suntola教授发明，到现在该技术已有40年的历史，国外已经实现产业化，比如英特尔公司研发的45纳米芯片、32纳米芯片中的high-k介电薄膜。 由于该发明及其在ALD研究方面的杰出贡献，Dr. Tuomo Suntola教授在2004年荣获欧洲SEMI奖。
芬兰PICOSUN公司黎微明博士介绍：
Dr. Wei-Min Li graduated as a M. Sc. in Chemistry in 1994 and received his PhD in Chemistry in 2000 from the University of Helsinki In Finland.
He started work with ALD technology over eighteen years ago and has gained experiences in thin film materials, processes and equipment for a wide range of applications in semiconductor, CMOS image sensor, flat panel display, photovoltaic industries and so on.
He joined ASM Microchemistry Ltd. in 2000 as a Senior Process Engineer for R&D of ALD technology. In 2006, he joined Silecs Oy and worked on process and development of siloxane polymers. He has held multiple managerial roles in process/application management, sales and marketing, product platform development and project management. With Picosun he holds the position of Applications Manager with emphasis on industrial applications of ALD technology.
He is an author of more than 30 publications and an inventor of more than 10 patents /applications in the field of ALD.
ALD技术发展到现在，主要的一些应用见下表：
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