| Vistec EBPG-5200+Electron-beam lithography system | Lithography/Patterning Equipment | West Lab | Litho. Lab | Open |
| Precision Imprint PI-D01 Nano-imprint lithography machine | Lithography/Patterning Equipment | West Lab | Litho. Lab | Open |
| SUSS MA6 Mask Aligner | Lithography/Patterning Equipment | West Lab | Litho. Lab | Open |
| SUSS MA6/BA6 Double-sided UV Mask Aligner | Lithography/Patterning Equipment | East Lab | Micro/Nanofabrication Lab | Open |
| ABM Contact Mask Aligner with Deep /Near UV Exposure System | Lithography/Patterning Equipment | East Lab | Photoelectric Devices Test Lab | Open |
| ZEISS Auriga SEM/FIB Crossbeam System | Lithography/Patterning Equipment | West Lab | Thin Film Lab I | Open |
| SVS OV-12 HMDS Vacuum oven | Lithography Misc | West Lab | Litho. Lab | Maintenance |
| HMDS Oven | Lithography Misc | West Lab | Litho. Lab | |
| SUSS Spin-coater | Lithography Misc | West Lab | Litho. Lab | Open |
| Laurell 650-8N Spin-coater | Lithography Misc | West Lab | Litho. Lab | Open |
| SUSS Spin-Coater | Lithography Misc | West Lab | Litho. Lab | Open |
| Laurell Spin-Coater | Lithography Misc | East Lab | Litho. Lab | Open |
| EVG Spray Coater | Lithography Misc | West Lab | Litho. Lab | |
| SUSS Delta HP8 hotplate | Lithography Misc | West Lab | Litho. Lab | Open |
| HP-303DU hotplate | Lithography Misc | West Lab | Litho. Lab | Open |
| Hotplate | Lithography Misc | East Lab | Litho. Lab | Open |
| Developing Wetbench | Lithography Misc | West Lab | Litho. Lab | Open |
| Laurel developer | Lithography Misc | West Lab | Litho. Lab | Open |
| Binder N2-Protecting Oven | Lithography Misc | West Lab | Wet Processes Lab I | Open |
| JingHong General Oven | Lithography Misc | East Lab | Litho. Lab | Open |
| SVCS Horizontal Oxidation Furnace | Thermal Process Equipment | West Lab | Oxidation/Diffusion Lab | Open |
| SVCS Horizontal Boron Diffusion Furnace | Thermal Process Equipment | West Lab | Oxidation/Diffusion Lab | Open |
| SVCS Horizontal Phosphorus Diffusion Furnace | Thermal Process Equipment | West Lab | Oxidation/Diffusion Lab | Open |
| SVCS Horizontal Polysilicon LPCVD Furnace | Thermal Process Equipment | West Lab | Oxidation/Diffusion Lab | Maintenance |
| SVCS Horizontal Silicon Nitride LPCVD Furnace | Thermal Process Equipment | West Lab | Oxidation/Diffusion Lab | Maintenance |
| THERMO RTP | Thermal Process Equipment | West Lab | Oxidation/Diffusion Lab | Open |
| Premtek Rapid Thermal Process Oven | Thermal Process Equipment | West Lab | Furnaces Lab | Open |
| Premtek Vacuum Rapid Thermal Process Oven | Thermal Process Equipment | West Lab | Furnaces Lab | Open |
| RTP-300 Rapid Thermal Processing Furance | Thermal Process Equipment | East Lab | Micro/Nanofabrication Lab | Open |
| Oxford PECVD system | Thin Film Deposition Equipment | West Lab | Thin Film Lab II | Open |
| Denton Electron Beam Evaporator | Thin Film Deposition Equipment | West Lab | Thin Film Lab I | Open |
| Denton Multi-target Magnetic Control Sputtering System | Thin Film Deposition Equipment | West Lab | Thin Film Lab I | Open |
| Ulvac Ultra-high Vacuum Sputtering System | Thin Film Deposition Equipment | East Lab | Micro/Nanofabrication Lab | Open |
| LH-Z550 Sputtering System | Thin Film Deposition Equipment | East Lab | Micro/Nanofabrication Lab | Maintenance |
| Ion Beam Sputtering System, IBD | Thin Film Deposition Equipment | East Lab | Micro/Nanofabrication Lab | Open |
| Automatic Muti-targets Sputtering System | Thin Film Deposition Equipment | East Lab | Photoelectric Devices Test Lab | Open |
| E-Beam Evaporator | Thin Film Deposition Equipment | East Lab | Photoelectric Devices Test Lab | Open |
| OLED Device Preparation System | Thin Film Deposition Equipment | East Lab | Photoelectric Devices Test Lab | Open |
| Sentech ICP Reactive Ion Etching System- For Metal Films | Dry Etching Equipment | West Lab | Thin Film Lab II | Open |
| NMC ICP Reactive Ion Etching System -For Dielectric Films | Dry Etching Equipment | West Lab | Thin Film Lab II | Open |
| SPTS ICP Deep Silicon Etching System | Dry Etching Equipment | West Lab | Thin Film Lab II | Open |
| NMC ICP Deep Silicon Etching System | Dry Etching Equipment | West Lab | Thin Film Lab II | Open |
| PVA-Tepla Microwave Stripper /Plasma processing system | Dry Etching Equipment | West Lab | Thin Film Lab II | Open |
| Ion Milling /Ion Beam Etching System | Dry Etching Equipment | East Lab | Micro/Nanofabrication Lab | Open |
| XeF2 Dry etching system | Dry Etching Equipment | East Lab | Micro/Nanofabrication Lab | Open |
| Plasma Photoresist stripper | Dry Etching Equipment | East Lab | Micro/Nanofabrication Lab | Open |
| PE-100 Plasma Etch Benchtop System | Dry Etching Equipment | East Lab | Photoelectric Devices Test Lab | Open |
| HARRICK Plasma Cleaner | Dry Etching Equipment | West Lab | Thin Film Lab I | Open |
| MOS-Level Standard RCA-Clean Wetbench | Wet cleaning and Wet etching Equipment | West Lab | Wet Processes Lab I | Open |
| Wetbench for Dielectric Etching | Wet cleaning and Wet etching Equipment | West Lab | Wet Processes Lab I | Open |
| Wetbench for Photoresist Inorganic Removal | Wet cleaning and Wet etching Equipment | West Lab | Wet Processes Lab I | Open |
| MOS-Level Wet Process Fumehood | Wet cleaning and Wet etching Equipment | West Lab | Wet Processes Lab II | Open |
| MOS-Level OEM Spin-Dryer | Wet cleaning and Wet etching Equipment | West Lab | Wet Processes Lab I | Open |
| Inorganic Remove Resist Fumehood | Wet cleaning and Wet etching Equipment | West Lab | Wet Processes Lab I | Open |
| Non-MOS-level Standard RCA-Clean Wetbench | Wet cleaning and Wet etching Equipment | West Lab | Wet Processes Lab II | Open |
| Wetbench for Metal Etching | Wet cleaning and Wet etching Equipment | West Lab | Wet Processes Lab II | Open |
| Wetbench for Bulk Silicon Etching | Wet cleaning and Wet etching Equipment | West Lab | Wet Processes Lab II | Open |
| Non-MOS-Level General Wetbench | Wet cleaning and Wet etching Equipment | West Lab | Wet Processes Lab II | Open |
| Non-MOS-Level OEM Spin Dryer | Wet cleaning and Wet etching Equipment | West Lab | Wet Processes Lab II | Open |
| BINDER Nitrogen Oven | Wet cleaning and Wet etching Equipment | West Lab | Wet Processes Lab | Open |
| Wafer Clean Equipment | Wet cleaning and Wet etching Equipment | East Lab | COMD Wet Processes Lab | Open |
| General Wetbench | Wet cleaning and Wet etching Equipment | East Lab | COMD Wet Processes Lab | Open |
| Acid-Cleaning Wetbench | Wet cleaning and Wet etching Equipment | East Lab | COMD Wet Processes Lab | Open |
| Ni and FeNi Micro-plating / Micro-casting System | Electroplating/Electrocasting System | East Lab | Micro/Nanofabrication Lab | Open |
| Automatic Gold Plating System | Electroplating/Electrocasting System | East Lab | Micro/Nanofabrication Lab | Open |
| Copper Plating Sink | Electroplating/Electrocasting System | East Lab | Micro/Nanofabrication Lab | Open |
| Grinding and Thinning Machine | Dicing/Abrasive/Polishing Equipment | East Lab | Micro/Nanofabrication Lab | Open |
| Fine Polishing Machines | Dicing/Abrasive/Polishing Equipment | East Lab | Micro/Nanofabrication Lab | Open |
| SPF-7100 Die Sawing System | Dicing/Abrasive/Polishing Equipment | East Lab | Micro/Nanofabrication Lab | Open |
| Fineplacer Chip Bonder | Packaging Equipment | West Lab | | |
| WB-91D Wire Bonder | Packaging Equipment | West Lab | | |
| Zeiss Ultra Plus Field Emission Scanning Electron Microscope | Characterization | West Lab | Characterization Lab | Open |
| Bruker ICON Atomic Force Microscope | Characterization | West Lab | Characterization Lab | Open |
| KLA-Tencor P7 Surface Profiler | Characterization | West Lab | Thin Film Lab I | Open |
| AMBiOS XP-200 Surface Profiler | Characterization | East Lab | COMD Wet Processes Lab | Open |
| Bruker Surface Profiler | Characterization | East Lab | Micro/Nanofabrication Lab | Open |
| FSM Film Stress Measurement System | Characterization | West Lab | Thin Film Lab II | Open |
| Ocean Optics UV Film Thickness Measurement | Characterization | West Lab | Thin Film Lab II | Open |
| Ocean Optics Film Thickness Measurement System with Microscope | Characterization | West Lab | Litho. Lab | Maintenance |
| CDEResMap Four Probe Resistance Tester | Characterization | West Lab | Oxidation/Diffusion Lab | Open |
| ZETA3D Non-Contact Optical Microscope/Profiler | Characterization | West Lab | Thin Film Lab II | Open |
| ZEISS Digital Microscope | Characterization | West Lab | Thin Film Lab II | Open |
| MM Probe Station and Agilent BA1500 Semiconductor Parameter Analyzer | Characterization | West Lab | Characterization Lab | Open |
| Keithley 4200 Semiconductor Characterization System | Characterization | East Lab | Photoelectric Devices Test Lab | Open |
| MMR Hall and Van der Pauw Measurement System | Characterization | West Lab | Characterization Lab | Open |
| Vibrating Sample Magnetometer | Characterization | East Lab | Micro/Nanofabrication Lab | Open |
