| 1 | Sentech ICP Reactive Ion Etching System- For Metal Films | West Lab | Thin Film Lab II | Open |
| 2 | NMC ICP Reactive Ion Etching System -For Dielectric Films | West Lab | Thin Film Lab II | Open |
| 3 | SPTS ICP Deep Silicon Etching System | West Lab | Thin Film Lab II | Open |
| 4 | NMC ICP Deep Silicon Etching System | West Lab | Thin Film Lab II | Open |
| 5 | PVA-Tepla Microwave Stripper /Plasma processing system | West Lab | Thin Film Lab II | Open |
| 6 | Ion Milling /Ion Beam Etching System | East Lab | Micro/Nanofabrication Lab | Open |
| 7 | XeF2 Dry etching system | East Lab | Micro/Nanofabrication Lab | Open |
| 8 | Plasma Photoresist stripper | East Lab | Micro/Nanofabrication Lab | Open |
| 9 | PE-100 Plasma Etch Benchtop System | East Lab | Photoelectric Devices Test Lab | Open |
| 10 | HARRICK Plasma Cleaner | West Lab | Thin Film Lab I | Open |
