高精度微喷墨打印系统

（High Precision Micro/Nano Deposition System）

主要用途/ Application：

Sonopot 微喷墨打印系统是区别于传统光刻工艺流程复杂，耗时耗力等突出限制的微纳米加工。此工艺可以精确释放沉积皮升级溶剂，在制作过程中没有加热和剪切应力因而不会改变溶剂特性再加上调试的可重复性，使得此设备广泛用于聚合物光电器件、有机电子、碳管石墨烯器件、不同材料的多重构筑、定位定量微纳修补以及制作各种材料薄膜等应用领域

The Sonopot micro/nano deposition is a micro/nano fabrication process that overcomes the complex and time-consuming limitations of traditional photolithography. This technique can precisely deposit solvents at the picoliter scale without applying heat or shear stress during the fabrication process, thereby preserving the solvent’s properties. Coupled with highly repeatable calibration, the system is widely used in applications such as polymer optoelectronic devices, organic electronics, carbon nanotube and graphene-based devices, multiple material construction, precise micro-nano repair, and the fabrication of thin films made from various materials.

 

设备工作原理简介/ Operating principle：

开机之后设定好预沉积的薄膜图形，然后通过释放器装载所需的微纳米材料，控制释放器沿着三轴方向移动，当释放器达到指定位置之后，给予相应的沉积电压，与释放器前端压电陶瓷粘接的喷头会在超声低频谐振释放技术的作用下，形成轴向谐振，将喷头中的微纳材料向半导体基材引流，从而使释放器中的微纳材料沉积到半导体基材表面，然后通过三轴定位系统来控制释放器不断的位移，来完成预先设定好的薄膜图形，从而完成整个微纳米材料的物理沉积过程。

After powering on, set the predefined thin-film pattern and load the required micro/nano materials into the dispenser. The dispenser is then controlled to move along the three-axis directions. When the dispenser reaches the specified position, a corresponding deposition voltage is applied. Under the action of ultrasonic low-frequency resonance release technology, the nozzle bonded to the piezoelectric ceramic at the front of the dispenser generates axial resonance, directing the micro-nano materials in the nozzle towards the semiconductor substrate. This process deposits the micro-nano materials onto the surface of the semiconductor substrate. The three-axis positioning system then continuously controls the movement of the dispenser to complete the predefined thin-film pattern, thereby finishing the physical deposition process of the micro-nano materials.

 

工艺能力/ capability

最小可做线宽尺寸可优于30um

The minimum achievable line width can be better than 30 µm.

 

技术指标/ Specifications：

1. 平台移动范围: X轴300 mm，Y轴300 mm，Z轴60 mm；
2. 可放置基底尺寸为250mm*250mm；
3. 喷头自吸式供液方式
4. 最小可做线宽尺寸可优于30um；
5. 可打印溶剂黏度450cps以下；
6. 打印微结构为非离散型，包括线和薄膜一次打印须为连续结构；
7. 打印液滴与基底无撞击力，不会产生卫星点；
8. 可编辑打印图形：点阵列、连续性线、折线、圆弧、连续薄膜等；
9. 具备实时CCD视频采集监控系统；

 

1. Platform movement range: X-axis 300 mm, Y-axis 300 mm, Z-axis 60 mm;
2. Accommodates substrates up to 250 mm x 250 mm;
3. Nozzle uses a self-priming liquid supply method;
4. Minimum achievable line width can be better than 30 µm;
5. Supports printing of solvents with viscosities below 450 cps;
6. The printed microstructures are non-discrete, including lines and films, requiring continuous structures in a single print;
7. Printed droplets have no impact force on the substrate, avoiding the formation of satellite dots;
8. Printable patterns include dot arrays, continuous lines, polylines, arcs, continuous films, etc.;
9. Equipped with a real-time CCD video monitoring system.

 

典型使用案例/ Typical scenario：

 

设备类别/Facilities：光刻/图形化设备/ Lithography/Patterning Equipment

设备编号/No.：WPK1MNDS1

设备地点/Location：东区光刻ⅢA区/ Wast Packaging Area I

 

工艺工程师/Engineer in response:

姓名：张笛；邮箱：captianzhangdi@sjtu.edu.cn；电话：13651735947

Name: Di Zhang；Email：fdwang@sjtu.edu.cn; Tel: 13651735947.

 

设备照片/Photos：