双光子三维微纳打印系统

（Two-photon Polymerization 3D micro/nano printing system）

主要用途/ Application：

1. 拥有一个强大的飞秒激光光源522nm，能够高效、高速的打印SU8,AZ胶、ma-P100胶以及金属层和ORMOCER有机-无机混合胶；
2. 特定于应用程序的写入模式可以在3D光刻和3D微打印之间快速轻松地切换;
3. 制作高度超过1厘米的宏观结构;
4. 制备具有优异表面质量粗糙度低至10 nm的微结构;
5. 最小特征尺寸低至100nm，扫描速度超过1000mm/s，定制的3D纳米、微米和宏观结构制造工艺让用户能够充分的利用各项工艺，并能够在单个工艺步骤中以高吞吐量生产复杂的微结构。
6. The MPO 100 includes a powerful femtosecond laser system operating at a wavelength of 522 nm, enabling efficient and high-speed processing of many commercially available polymer systems, including the ORMOCER®s, SU-8, AZ-series, ma-P 1200, Metal layer (e.g. Ag, Au, Cr, …);
7. Customizable Write Modes enable fast and easy switching between 3D Lithography and 3D Microprinting;
8. Macrostructures with a height exceeding 1 cm can be fabricated;
9. Microstructures with superior surface quality exhibiting a roughness of down to 10 nm can be fabricated;
10. The achievable minimum feature size of down to 100 nm and the accessible scan speed of over 1000 mm/s provide full user benefit for tailored 3D nano-, micro- and microfabrication processes.

设备工作原理简介/ Operating principle：

MPO 100是一种用于3D光刻和3D微打印的双光子聚合(TPP)系统，使用双光子聚合技术使光刻胶或者金属材料结构化。该系统具有高精度的3D光刻和高打印量的3D微打印，支持高分辨率的增材和减材制造。增材制造是一层一层的精确构建，而减材制造则是高精度地去除材料，以制造复杂的功能微结构。

The MPO 100 is a Two-Photon Polymerization (TPP) system for 3D lithography and 3D microprinting. The system excels through high precision for 3D lithography and high print volume for 3D microprinting, supporting high-resolution additive and subtractive manufacturing. The additive manufacturing builds up precisely layer upon layer while the subtractive manufacturing removes material with high accuracy to fabricate complex functional microstructures.

工艺能力/ Capability：

1. 飞秒激光器：波长λ＝522±3nm
2. 打印高度：≥1 cm;
3. 表面粗糙度：≤10 nm;
4. 分辨率：≤100 nm（横向）；
5. 对准精度≤5 um；
6. 打印面积：100 x 100 mm2；
7. 扫描速度：10m/s除以放大率（10x写入模块: 不小于1000mm/s）；
8. 材料（增材或减材）：ORMOCER®s, SU-8, AZ-series, ma-P 1200, 金属 (e.g. Ag, Au, Cr, …)；
9. 加工模式：无拼接制造能力(Stitching Free)，同步振镜扫描仪和工作台（无限视场，IFoV）以实现无拼接制造
10. 扫描策略：全体积扫描逐层曝光整个结构；轮廓扫描；剖面扫描过程中随着强度变化进行体素调整。
11. Femtosecond laser: λ＝522±3nm
12. Print height (max.): ≥1 cm;
13. Roughness (min.): ≤10 nm;
14. Minimum feature size: ≤100 nm (lateral) ;
15. Overlay accuracy: ≤5μm;
16. Print area : 100 x 100 mm²;
17. Scan speed (max.): 10 m/s divided by magnification (e.g. 1000 mm/s for 10x);
18. Materials (additive or subtractive): ORMOCER®s, SU-8, customer-specific resins, AZ-series, ma-P 1200, metal layers (e.g. Ag, Au, Cr, …);
19. Structuring modes：Scan-and-Step with advanced stitching algorithms; Stage only for stitching-free fabrication; Synchronized Infinite Field-of-View (IFoV) for stitching-free fabrication;
20. Scan strategy: Conventional layer-by-layer fabrication; Voxel Tuning with intensity variation during hatching.

 

典型使用案例/ Typical scenario：

• 微光学；
• 光电子学；
• 微机械学；
• 生物医学工程；
• 量子器件。

1. Micro-Optics;
2. Photonics;
3. Micromechanics;
4. Biomedical Engineering；
5. Quantum Devices.

 

设备类别/Facilities：光刻/图形化设备/ Lithography/Patterning Equipment

设备编号/No.：ELT3MPO01

设备地点/Location：东区光刻ⅢA区

 

艺工程师/Engineer in response:

姓名：徐丽萍；邮箱：lipingxu@sjtu.edu.cn；电话：021-34206126-6030

Name: Liping Xu；Email：lipingxu@sjtu.edu.cn; Tel: 021-34206126-6030.

 

设备照片/Photos：